Overview of Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot
Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot comprises a broad category of finely divided, solid particles derived from various metals or metal alloys. These powders exhibit unique characteristics that make them indispensable in modern manufacturing and advanced technologies.
Key Characteristics of Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot
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Particle Size and Distribution: The size and uniformity of particles significantly influence flowability, packing density, and the final product’s mechanical and physical properties. Finer powders generally offer a larger surface area, which is beneficial for reactions and sintering but may also increase aggregation.
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Composition: Metal powders can be elemental (pure metal) or alloyed, combining two or more metals to achieve desired properties such as enhanced strength, corrosion resistance, or electrical conductivity.
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Shape: Particle shapes range from spherical to irregular or flake-like. Spherical powders provide better flowability and packing, while flake-shaped powders are suited for coatings and electronic applications due to their unique orientation and surface area.
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Purity: Depending on the application, metal powders can be highly purified to remove impurities, critical for uses in electronics, aerospace, and medical devices where contamination could compromise performance.
(Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot)
Parameters of Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot
Indium-Tin-Oxide (ITO) is a thin film material commonly used in various applications, including touchscreens, solar cells, and conductive glass. The sputtering target for ITO is typically made from high-purity indium metal mixed with tin and oxygen to form the oxide compound.
When referring to an ITO sputtering target made from 99.995% pure indium metal ingot, the key parameters you would expect to find are:
1. **Material Composition**: The target consists of 99.995% Indium (In) and a small percentage (usually around 1%) of Tin (Sn) to create the ITO alloy. The remaining 0.005% could be impurities or trace elements.
2. **Purity Grade**: 99.995% indicates that the indium ingot is extremely pure, with only a very small amount of impurities present. This level of purity is crucial for maintaining consistent film quality and performance.
3. **Size and Shape**: The target can come in different shapes and sizes, such as circular, square, or rectangular, depending on the intended application and sputtering system requirements. Common diameters range from a few centimeters to several inches.
4. **Crystal Structure**: Indium metal usually has a face-centered cubic (FCC) crystal structure, which helps in achieving the desired ITO microstructure.
5. **Density**: The density of pure indium is approximately 7.31 g/cm³, but this may slightly vary due to the addition of tin and other elements.
6. **Melting Point**: Indium’s melting point is around 156.6°C (314.8°F), but during sputtering, it will be in a plasma state, so the actual operating conditions are much higher.
7. **Thermal Conductivity**: High thermal conductivity is a characteristic of indium, which aids in efficient heat dissipation during the sputtering process.
8. **Sputter Yield**: This parameter refers to the amount of material deposited per unit energy applied, and it depends on the target’s composition and sputtering conditions.
9. **Surface Finish**: The surface finish of the target should be smooth and flat for optimal deposition efficiency.
Please note that specific values for some of these parameters may vary depending on the manufacturer and the exact process used to produce the ITO sputtering target.
(Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot)
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FAQs of Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot
Q1. What exactly is Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot, and how is it different from solid metal?
Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot consists of tiny particles of pure metals or metal alloys. Unlike solid metal, which exists as a continuous mass, metal powder offers increased surface area, making it more reactive and easier to form into complex shapes through processes like sintering or 3D printing.
Q2. How is Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot produced, and what are the common production methods?
Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot is typically produced through several methods, including:
– Atomization: Molten metal is sprayed into fine droplets that cool and solidify into powder.
– Chemical reduction: Metal oxides are reduced to their elemental state to form powder.
– Electrolysis: Electrical current is used to deposit metal onto a cathode, later harvested as powder.
– Mechanical processes: Large metal pieces are milled or ground down into powder.
Q3. What factors determine the quality and suitability of metal powders for different applications?
Quality and suitability depend on factors like:
– Particle size and distribution: Affects flowability, packing density, and final product properties.
– Composition and purity: Determines the material’s properties and its appropriateness for specific uses.
– Shape: Spherical powders for better flow, flake shapes for coatings.
– Density and porosity: Influences strength and other mechanical properties.
Q4. What safety precautions should be taken when handling metal powders?
Safety measures include:
– Wearing personal protective equipment (PPE) like gloves, goggles, and respirators.
– Storing powders in airtight containers away from moisture, heat, and ignition sources.
– Using explosion-proof equipment in processing areas.
– Ensuring proper ventilation to avoid dust accumulation and inhalation risks.
– Following strict handling procedures to prevent spills and cross-contamination.
Q5. How are Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot used in the manufacturing industry?
Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot find applications in:
– Powder Metallurgy: To create parts by compacting and sintering, ideal for mass production of complex components.
– Additive Manufacturing (3D Printing): Layer-by-layer construction of parts for customized and intricate designs.
– Thermal Spray Coatings: Applying protective or functional coatings to surfaces for corrosion resistance, etc.
– Electronics: Precious metal powders in conductive pastes, connectors, and other components.
– Chemical and Catalyst Industries: As catalysts due to their high surface area, promoting chemical reactions.
Q6. Are Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot recyclable or reusable?
Yes, Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot can often be recycled or reused. Unused powder or scrap from manufacturing processes can frequently be collected, reprocessed, and reintroduced into production cycles, contributing to sustainable manufacturing practices.
Q7. How does the cost of Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot compare to traditional metal forms?
The cost depends on factors like the metal type, production method, and purity. While Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot may initially seem more expensive due to additional processing, their efficiency in certain manufacturing processes (like producing complex shapes with minimal waste) can lead to overall cost savings.
(Indium-Tin-Oxide (ITO) Sputtering Target In Metal Indium Ingot 99.995% Indium Metal Ingot)
