Overview of PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target
Molybdenum (Mo) is a chemical element with the atomic number 42 and is represented by the symbol Mo on the periodic table. It is a transition metal located in group 6 and period 5. Molybdenum is known for its high melting point, excellent strength, and thermal stability, making it a crucial component in various industrial applications.
Feature of PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target
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High Melting Point: Molybdenum has one of the highest melting points among all pure elements, at 2,623°C (4,753°F). This property makes it ideal for high-temperature applications.
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Strength and Toughness: Even at high temperatures, molybdenum maintains its strength and hardness, which is essential for use in extreme environments.
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Corrosion Resistance: Molybdenum exhibits good corrosion resistance to many acids and alkalis, although it can be attacked by oxidizing acids like nitric acid.
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Thermal Conductivity: It is an excellent conductor of heat, making it suitable for applications where efficient heat transfer is required.
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Alloying Agent: Molybdenum is widely used as an alloying agent, particularly with steel, to enhance hardness, toughness, and resistance to wear and corrosion. Stainless steels often contain molybdenum for these properties.
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Electrical Applications: Due to its low resistivity and high-temperature stability, molybdenum is used in electrical contacts and heating elements.
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Lubricity: Molybdenum disulfide (MoS₂) is a common dry lubricant, providing low friction surfaces in high-pressure, high-temperature conditions.
(PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target)
Parameters of PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target
The PVD (plasma-enhanced chemical vapor deposition) target for MoS2/MoS2-doped Molybdenum Sulfide is typically made of materials like tungsten carbide, silicon carbide, or aluminum oxide. The properties of the target can be tailored by adjusting the composition and surface finish of the material.
The parameters that affect the performance of the PVD target include:
1. Composition: The composition of the target determines its chemical bonding capabilities and sputtering rate. MoS2 has strong covalent bonds with sulfur and oxygen, while Molybdenum Sulfide has weak metallic bonds with sulfur and oxygen. A higher composition may result in faster sputtering rates, but it may also require higher pressure and temperature to achieve a good surface quality.
2. Surface finish: The surface finish of the target affects the adhesion of the deposited material and the sputtering rate. A rougher surface will create a better bond between the PVD target and the substrate, leading to more consistent sputtering results.
3. Pressure: The pressure applied during PVD can control the sputtering rate and improve the surface quality. Higher pressures will generally result in faster sputtering rates and a lower surface contamination rate, while lower pressures may result in a higher sputtering rate and a higher surface contamination rate.
4. Temperature: The temperature applied during PVD can affect the reactivity of the substrate and the energy transfer from the PVD target to the substrate. Higher temperatures will generally result in faster reactivity and a higher energy transfer rate, while lower temperatures may result in slower reactivity and a lower energy transfer rate.
These parameters can be adjusted to optimize the performance of the PVD target for specific applications. For example, if you need a high-quality PVD target for applications such as microelectronics or nanotechnology, you may want to choose a target made of a harder material with a higher melting point. If you need a target for applications such as metal film etching or metal surface modification, you may want to choose a target made of a softer material with a lower melting point. Additionally, you may want to consider using various types of PVD targets depending on your specific requirements, such as those based on the type of substrates you will be working with or the desired sputtering rates and quality of the deposited material.
(PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target)
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FAQ
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What are the primary uses of PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target?
PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target is primarily used in the production of steel alloys, accounting for over 80% of its consumption. It’s also used in chemicals, lubricants, electronics, and specialized applications like lighting and nuclear energy.
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Is molybdenum found naturally?
Yes, molybdenum is found naturally in the Earth’s crust, often in minerals like molybdenite (MoS₂) and powellite (CaMoO₄). It is mined as a byproduct of copper mining.
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How does PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target affect human health?
In small amounts, molybdenum is an essential trace element for humans, playing a role in enzyme functions. However, excessive intake can lead to toxicity, though this is rare under normal dietary conditions.
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Is molybdenum magnetic?
Molybdenum itself is not magnetic. It is classified as a diamagnetic material, meaning it repels magnetic fields slightly rather than being attracted to them.
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What industries rely heavily on molybdenum?
The steel industry is the largest consumer of molybdenum, followed by the chemical, oil and gas, automotive, aerospace, and construction industries.
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Is recycling molybdenum possible?
Yes, molybdenum can be recycled from scrap materials. Given its valuable properties and relative scarcity, recycling helps conserve resources and is economically viable.
(PVD target MoS2 molybdenum disulfide molybdenum sulfide sputtering target)
