Overview of Factory High purity 99.99% Titanium Aluminum sputtering target for evaporation coating
Titanium (Ti) is a chemical element with the atomic number 22 and is symbolized as Ti on the periodic table. It belongs to the transition metals group and is known for its low density, high strength-to-weight ratio, and exceptional corrosion resistance. Discovered in 1791 by William Gregor, titanium has become a vital material across numerous industries due to its unique combination of properties.
Feature of Factory High purity 99.99% Titanium Aluminum sputtering target for evaporation coating
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Low Density and High Strength: Titanium is about 45% lighter than steel but possesses similar strength, making it ideal for applications where weight reduction is critical without compromising strength.
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Corrosion Resistance: It forms a passive oxide layer that protects the underlying metal from corrosive substances, including sea water and chlorine, making it highly resistant to corrosion.
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Biocompatibility: Titanium is well-tolerated by the human body and doesn’t cause adverse reactions, which is why it’s widely used in medical implants and surgical instruments.
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Heat Resistance: With a melting point of 1,668°C (3,034°F), titanium can withstand high temperatures, making it suitable for aerospace and automotive applications.
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Non-Magnetic and Non-Toxic: These properties make titanium ideal for applications in MRI machines and other sensitive electronic devices.
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Fatigue Resistance: Titanium demonstrates excellent resistance to metal fatigue, crucial in cyclic loading applications such as aircraft parts.
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(Factory High purity 99.99% Titanium Aluminum sputtering target for evaporation coating)
Parameters of Factory High purity 99.99% Titanium Aluminum sputtering target for evaporation coating
The manufacturer of the high-purity titanium aluminum sputtering target, typically known as Ti3Al4, is likely to have a specific purpose or material range in mind when designing and manufacturing this target. However, without more information about their target, it’s difficult to provide an accurate answer.
When designing a target for a particular application, there are several factors to consider, including:
1. Specific application requirements: The target must meet the specific requirements of the application, such as temperature, pressure, and applied application.
2. Material selection: The target should be selected with consideration for the desired properties, such as its surface roughness, shape, and distribution. The material being used will also affect the targeted performance.
3. Process requirements: The target must adhere to the intended process, such as exposure to certain gases or chemicals, which can affect its behavior.
4. Safety concerns: It’s important to ensure that the target is safe and meets any safety standards set by the manufacturer or regulatory body.
Based on these considerations, some possible parameters that could be used to design and manufacture a high-purity titanium aluminum sputtering target for evaporation coating include:
– Material composition: The target should be made from titanium and be free of impurities or defects that can impact its performance.
– Temperature range: The target should be designed to operate at a suitable temperature range, depending on the application and desired output.
– Pressure range: The target should be designed to operate under the desired pressure level, depending on the application and desired output.
– Surface roughness: The target should be made with a smooth surface, to improve the targeted performance and avoid any damage to the coating during processing.
– Application: The target should be specifically designed for the application, such as automotive or aerospace applications.
– Safety concerns: The target should meet all safety requirements set by the manufacturer or regulatory body, including shock resistance, impact resistance, and toxicity analysis.
(Factory High purity 99.99% Titanium Aluminum sputtering target for evaporation coating)
Company Profile
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(Factory High purity 99.99% Titanium Aluminum sputtering target for evaporation coating)
