Overview of Most popular type high purity 99.5-99.995% titanium alloy tube target rotary titanium (Ti) metal alloy sputtering targets
Titanium (Ti) is a chemical element with the atomic number 22 and is symbolized as Ti on the periodic table. It belongs to the transition metals group and is known for its low density, high strength-to-weight ratio, and exceptional corrosion resistance. Discovered in 1791 by William Gregor, titanium has become a vital material across numerous industries due to its unique combination of properties.
Feature of Most popular type high purity 99.5-99.995% titanium alloy tube target rotary titanium (Ti) metal alloy sputtering targets
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Low Density and High Strength: Titanium is about 45% lighter than steel but possesses similar strength, making it ideal for applications where weight reduction is critical without compromising strength.
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Corrosion Resistance: It forms a passive oxide layer that protects the underlying metal from corrosive substances, including sea water and chlorine, making it highly resistant to corrosion.
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Biocompatibility: Titanium is well-tolerated by the human body and doesn’t cause adverse reactions, which is why it’s widely used in medical implants and surgical instruments.
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Heat Resistance: With a melting point of 1,668°C (3,034°F), titanium can withstand high temperatures, making it suitable for aerospace and automotive applications.
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Non-Magnetic and Non-Toxic: These properties make titanium ideal for applications in MRI machines and other sensitive electronic devices.
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Fatigue Resistance: Titanium demonstrates excellent resistance to metal fatigue, crucial in cyclic loading applications such as aircraft parts.
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(Most popular type high purity 99.5-99.995% titanium alloy tube target rotary titanium (Ti) metal alloy sputtering targets)
Parameters of Most popular type high purity 99.5-99.995% titanium alloy tube target rotary titanium (Ti) metal alloy sputtering targets
The most popular type of titanium tube target for high purity high purity 99.5-99.995% titanium alloy is the Type T01. This target is made with Ti and a high and is used in binary time-invariant microsputtering.
Some additional factors to consider when choosing a titanium target include:
1. The specific application: What type of material you want to target? High-purity 99.5-99.995% titanium alloys have relatively low temperature cycling rates compared to other metals, so it’s important to choose a target that can withstand these high temperatures.
2. Silicon: Silicon is another widely used high-purity material in binary time-invariant microsputtering. It has a moderate melting point and good thermal resistance, making it suitable for use in high-throughput systems.
3. Glass Fiber Reinforced Polymer (GFRP): fibers are an alternative to Ti for high-performance binary time-invariant microsputtering applications due to their high mechanical strength and thermal stability.GFRP targets can be customized to meet specific needs, such as longer lifetimes or lower weight.
4. Ion Source Technology: Depending on the intended application, ion source technology may be preferred over surface tuning technologies for high-purity titanium targets. Ion source targets typically offer higher energy density, but may require more accurate control over the crystal structure.
When selecting a titanium target for high purity and high-cycling performance, it’s essential to consider your specific requirements and choose a target that meets those criteria.
(Most popular type high purity 99.5-99.995% titanium alloy tube target rotary titanium (Ti) metal alloy sputtering targets)
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(Most popular type high purity 99.5-99.995% titanium alloy tube target rotary titanium (Ti) metal alloy sputtering targets)
